S. I. Zhuk, T. A. Gevel, Yu. P. Zaikov.
ABSTRACT
In this work, the influence of the substrate material on the kinetics and mechanism of silicon electrodeposition from the (mol %) 66.51KF-33.26KCl-0.23K2SiF6 melt at a temperature of 750°C was studied by means of cyclic chronovoltammetry. It was shown that silicon electrodeposition on glassy carbon, silver, and silicon electrodes occurs in the potential region from -0.05 to -0.20 V relative to the potential of the silicon quasi-reference electrode. Silicon electrodeposition is accompanied with the cathode current peak formation. Based on the analysis of the ip(ν1/2) and Ep(lnν) dependences, it was found that the process under study is proceeds in one electrochemically irreversible step. On the nickel electrode, silicon electrodeposition occurs at a potential more negative than 0.20 V relative to the potential of the silicon quasi-reference electrode. Such depolarization associated with the formation of the Ni2Si compound.
According to the Matsuda-Ayabe equation for an electrochemically irreversible process, the diffusion coefficients of electroactive ions was estimated, which ranged from 2.8 to 5.8·10-5 cm2/s, depending on the material of the cathode substrate.
On the basis of electrochemical measurements, the parameters of silicon electrodeposition on different cathode substrates were determined.
KEY WORDS:
silicon, KCl-KF-K2SiF6, electrodeposition, chrono voltammetry, alloying
DOI: 10.31857/S0235010621040101
